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- Title: Strain-Engineered MOSFETs
- Authors C.K. Maiti, T.K. Maiti
- Publisher: CRC Press; 1st edition (October 3, 2018); eBook (Creative Commons Licensed)
- License(s): Creative Commons License (CC)
- Hardcover: 320 pages
- eBook: PDF, ePub, and Read Online
- Language: English
- ASIN: B00OD4B0UI
- ISBN-10: 1138075604
- ISBN-13: 978-1138075603
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This book brings together new developments in the area of strain-engineered MOSFETs using high-mibility substrates such as SIGe, strained-Si, germanium-on-insulator and III-V semiconductors into a single text which will cover the materials aspects, principles, and design of advanced devices, their fabrication and applications. The book presents a full TCAD methodology for strain-engineering in Si CMOS technology involving data flow from process simulation to systematic process variability simulation and generation of SPICE process compact models for manufacturing for yield optimization.
About the Authors- N/A
- Electrical and Electronic Engineering
- Very Large Scale Integration (VLSI)
- Microcontrollers, PLC, etc.
- Embedded Systems
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